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Sputtering line for AZO/ITO glass coating
Sputtering line for AZO/ITO glass coating
The sputtering line is available and applicable to the PVD deposition of transparent conductive films such as TN (titanium dioxide), STN (Super Twisted Nematic), TP (touch panel) and CF (color film), etc on glass substrates, such as resistive or capacitive screens, or coating front and back electrodes on thin film solar cell panels. It is extensively used in many industries with diverse coating functions.
The sputtering line can be designed and manufactured as per customer’s specific requirements and actual needs. For details, please contact Alex Li by below message:
Alex Li
Mobile: 86 13929890858
Wechat: metallizer
Skype: vacuum-metallizer
Email: vacuumsale@hotmail.com
Website: http://www.pvd-metallizer.com
Recently Posted
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Ion-assisted deposition
May 31, 2017Ion-assisted deposition http://www.pvd-metallizer.com In ion-assisted deposition (IAD), the substrate is exposed to a se
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Reactive sputtering
May 31, 2017Reactive sputtering http://www.pvd-metallizer.com In reactive sputtering, the sputtered particles undergo a chemical rea
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Ion-beam sputtering
May 31, 2017Ion-beam sputtering http://www.pvd-metallizer.com Ion-beam sputtering (IBS) is a method in which the target is external
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Types of sputter deposition
May 31, 2017Types of sputter deposition http://www.pvd-metallizer.com Sputtering sources often employ magnetrons that util
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